An off-line experiment was performed to estimate a model for on-line process control which describes the empirical relationship between the design and production factors affecting the front wheel ...

Shrinking technology nodes and smaller process margins require improved photolithography overlay control. Generally, overlay measurement results are modeled with Cartesian polynomial functions for ...

Aspen Technology's Elinor Price describes how advanced process control modeling and simulation can become part of the modern control room. An upcoming feature article in January, "Changing Workforce ...

A new process control method uses a special mathematical structure to accurately estimate the internal process variables of a system, even when external sensors are damaged. Be it nuclear power plants ...

While dynamic modeling is arguably one of the most important technological developments for engineers in the last 50 years, many process control engineers are unable to use it. It requires proper time ...

Semiconductor process engineers would love to develop successful process recipes without the guesswork of repeated wafer testing. Unfortunately, developing a successful process can’t be done without ...